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Journal Article
P. Laha, Panda, A. B., Dahiwale, S., Date, K. S., Patil, K. R., Barhai, P. K., Das, A. K., Banerjee, I., and Mahapatra, S. K., “Effect of leakage current and dielectric constant on single and double layer oxides in MOS structure”, Thin Solid Films, vol. 519, no. 5, pp. 1530-1535, 2010.