C-H activation of methane to formaldehyde on Ce1-xZrxO2 thin films: a step to bridge the material gap

TitleC-H activation of methane to formaldehyde on Ce1-xZrxO2 thin films: a step to bridge the material gap
Publication TypeJournal Article
Year of Publication2016
AuthorsDubey, A, Kolekar, SK, Gopinath, CS
JournalChemCatChem
Volume8
Issue23
Pagination3650–3656
Date PublishedDEC
Type of ArticleArticle
Abstract

Ce1−xZrxO2 (CZ) thin films were prepared by a combination of sol–gel and spin-coating methods and were evaluated for the C−H activation of methane by using a molecular beam set-up with the aim to bridge the material gap. The C−H activation of methane begins at 950 K, and a Ce-rich CZ composition displays a high selectivity (4–12 %) to the partially oxidised product, formaldehyde. A 10–12 % selectivity towards HCHO with 1.6 % methane conversion was observed with methane-rich CH4/O2 reactant compositions at 1050 K. Short contact times, prevalent under molecular beam conditions, could be a possible reason for HCHO formation. Although combustion products were observed instantly upon shining the mixture of reactants on CZ surfaces, up to 20 s delay was observed before formaldehyde generation, which indicates that the oxygen vacancy migration contributes to the rate-determining step and the diffusion-controlled nature of the reaction. A burst in HCHO generation at the point of molecular beam opening, after beam-closed conditions, suggests that the diffusion of oxygen vacancies to the surface is the reason for HCHO formation. Kinetics results also indicate the necessity of reduction sites for HCHO generation.

DOI10.1002/cctc.201600670
Funding Agency

Council of Scientific & Industrial Research (CSIR) - India

Type of Journal (Indian or Foreign)

Foreign

Impact Factor (IF)4.724
Divison category: 
Catalysis and Inorganic Chemistry