Adsorption of methanol on Si(100)/SiO(2)and mesoporous SBA-15
| Title | Adsorption of methanol on Si(100)/SiO(2)and mesoporous SBA-15 |
| Publication Type | Journal Article |
| Year of Publication | 2006 |
| Authors | Mirji, SA, Halligudi, SB, Mathew, NT, Ravi, V, Jacob, NE, Patil, KR |
| Journal | Colloids and Surfaces A-Physicochemical and Engineering Aspects |
| Volume | 287 |
| Pagination | 51-58 |
| Date Published | SEP |
| ISSN | 0927-7757 |
| Keywords | Adsorption, desorption, kinetics, Methanol, SBA-15, Si(100)/SiO2, thermal stability |
| Abstract | Adsorption of methanol on SiO(100)/SiO2 substrate and mesoporous SBA-15 has been studied by using Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS). Contact angle technique is employed to study the adsorption kinetics of methanol on SiO(100)/SiO2 and thermal stability of adlayer. Thermogravimetric (TGA) technique is used to understand the thermal behavior of methanol layer on SBA-15. Adsorption kinetics fit fairly well with Langmuir isotherms giving adsorption rate constant, k(a) = 0.0021 W s(-1). FTIR results show formation of methoxy silicon (SiOCHA silicon polyhydride (SiH2), carboxylate, molecular water and hydroxyl groups on Si(100)/SiO2 surface and only methoxy silicon on SBA-15. XPS results confirm methanol adsorption and support FTIR results. The methanol adlayers are found to be thermally stable up to a temperature of similar to 262 degrees C on both Si(100)/SiO2 and SBA-15 and decompose between 262 and 450 degrees C. (c) 2006 Elsevier B.V. All rights reserved. |
| DOI | 10.1016/j.colsurfa.2006.03.021 |
| Type of Journal (Indian or Foreign) | Foreign |
| Impact Factor (IF) | 2.76 |