<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>25</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Dwivedi, Mayank</style></author><author><style face="normal" font="default" size="100%">Rao, Locanindi Hari Sarvothama</style></author><author><style face="normal" font="default" size="100%">Mohan, Srinivasulu Reddy Krishna</style></author><author><style face="normal" font="default" size="100%">Dhanasekharan, Janakiraman</style></author><author><style face="normal" font="default" size="100%">Rao, Bevara Madhusudana</style></author><author><style face="normal" font="default" size="100%">Kumar, Sriperambudur Rajesh</style></author><author><style face="normal" font="default" size="100%">Ponrathnam, Surendra</style></author><author><style face="normal" font="default" size="100%">Rajan, Chelanattukizhakkemadath Raman</style></author><author><style face="normal" font="default" size="100%">Tayal, Rajiv Kumar</style></author><author><style face="normal" font="default" size="100%">Shadbar, Qureshi Mohammed</style></author><author><style face="normal" font="default" size="100%">Chavan, Nayaku</style></author><author><style face="normal" font="default" size="100%">Deokar, Sarika Babasaheb</style></author><author><style face="normal" font="default" size="100%">Mulani, Khudbudin Baban</style></author><author><style face="normal" font="default" size="100%">Ghorpade, Ravindra V.</style></author><author><style face="normal" font="default" size="100%">Bhongale, Sunil Sitaram</style></author><author><style face="normal" font="default" size="100%">Nalawade, Archana Chetan</style></author><author><style face="normal" font="default" size="100%">Sontakke, Kalpana Vishwanathrao</style></author><author><style face="normal" font="default" size="100%">Bhosle, Sonali Madhavrao</style></author><author><style face="normal" font="default" size="100%">Mule, Smita Atmaram</style></author><author><style face="normal" font="default" size="100%">Dhoble, Deepa Arun</style></author><author><style face="normal" font="default" size="100%">John, Aruldoss</style></author><author><style face="normal" font="default" size="100%">Shaikh, Wasif Abdul Lateef</style></author><author><style face="normal" font="default" size="100%">Harikrishna, Reghunathan</style></author><author><style face="normal" font="default" size="100%">Punitharasu, Vellimala</style></author><author><style face="normal" font="default" size="100%">Momin, Mohasin Shamshuddin</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Amino functionalized oligo polyimides with enhanced storage stability</style></title><secondary-title><style face="normal" font="default" size="100%"> WO2012090055A1</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2012</style></year><pub-dates><date><style  face="normal" font="default" size="100%">JUL</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">EP 11817412 A 20111228</style></number><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;The invention relates to an improved process for the preparation of amino functionalized oligomeric monomeric reactant type polyimides having higher stability. More particularly it relates to a process for the preparation of soluble imide prepolymers, used as matrix resins that can be rapidly cured with multi-functional moieties such as diepoxy, dicarboxyl, anhydride, diisocyanates to form crosslinked structures having enhanced thermal stability and mechanical strength.&lt;/p&gt;</style></abstract></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Rajdeo, K. S.</style></author><author><style face="normal" font="default" size="100%">Ponrathnam, S.</style></author><author><style face="normal" font="default" size="100%">Pardeshi, S.</style></author><author><style face="normal" font="default" size="100%">Chavan, Nayaku</style></author><author><style face="normal" font="default" size="100%">Bhongale, Sunil Sitaram</style></author><author><style face="normal" font="default" size="100%">Harikrishna, Reghunathan</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Ambient temperature photocopolymerization of tetrahydrofurfuryl methacrylate and isobornyl methacrylate: reactivity ratios and thermal studies</style></title><secondary-title><style face="normal" font="default" size="100%">Journal of Macromolecular Science Part A-Pure and Applied Chemistry</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">Copolymer</style></keyword><keyword><style  face="normal" font="default" size="100%">methacrylates</style></keyword><keyword><style  face="normal" font="default" size="100%">micro structure</style></keyword><keyword><style  face="normal" font="default" size="100%">photocopolymerization</style></keyword><keyword><style  face="normal" font="default" size="100%">reactivity ratios</style></keyword><keyword><style  face="normal" font="default" size="100%">thermal studies</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2015</style></year><pub-dates><date><style  face="normal" font="default" size="100%">DEC</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">12</style></number><publisher><style face="normal" font="default" size="100%">TAYLOR &amp; FRANCIS INC</style></publisher><pub-location><style face="normal" font="default" size="100%">530 WALNUT STREET, STE 850, PHILADELPHIA, PA 19106 USA</style></pub-location><volume><style face="normal" font="default" size="100%">52</style></volume><pages><style face="normal" font="default" size="100%">982-991</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Photocopolymerization of heterocyclic monomer namely, tetrahydrofurfuryl methacrylate with bulky bicyclic monomer, isobornyl methacrylate with different feed ratios was carried out in bulk with low concentration of an -hydroxyl ketone based photoinitiator. The ambient temperature photocopolymerization was carried out by using a UV-Visible lamp with fixed low intensity of 0.4mW cm(-2) for a period of 6min. The residual monomer remained in the polymerization process were determined by using gas chromatography. The reactivity ratio values for the two monomers were calculated from the copolymer composition data by using Fineman-Ross, Kelen-Tudos, Extended Kelen-Tudos and Mao-Huglin methods. Individually, as well as the average of all the methods revealed that the monomer reactivity ratios of tetrahydrofurfuryl methacrylate were higher than isobornyl methacrylate. The dyad sequence distribution and dyad sequence lengths were calculated using the Igarashi and Pyun method and the sequence length distribution for tetrahydrofurfuryl methacrylate was observed to be higher with an increase in its feed content. This supports the reactivity ratio studies that a higher monomer reactivity ratio value for tetrahydrofurfuryl methacrylate was observed as compared to its comonomer. The thermal studies showed that the glass transition temperatures of the copolymers increased with an increase in isobornyl methacrylate content.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">12</style></issue><custom3><style face="normal" font="default" size="100%">&lt;p&gt;Foreign&lt;/p&gt;</style></custom3><custom4><style face="normal" font="default" size="100%">0.963</style></custom4></record></records></xml>