<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Godbole, P. D.</style></author><author><style face="normal" font="default" size="100%">Mitra, A.</style></author><author><style face="normal" font="default" size="100%">Pasricha, R.</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Patil, K. R.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Deposition and characterization of silver nano-films by a novel solid liquid interface reaction technique (SLIRT)</style></title><secondary-title><style face="normal" font="default" size="100%">Materials Letters</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">Electron microscopy</style></keyword><keyword><style  face="normal" font="default" size="100%">Nano-Particles</style></keyword><keyword><style  face="normal" font="default" size="100%">solid-liquid interface reaction</style></keyword><keyword><style  face="normal" font="default" size="100%">thin film</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2005</style></year><pub-dates><date><style  face="normal" font="default" size="100%">JUN</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">14-15</style></number><publisher><style face="normal" font="default" size="100%">ELSEVIER SCIENCE BV</style></publisher><pub-location><style face="normal" font="default" size="100%">PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS</style></pub-location><volume><style face="normal" font="default" size="100%">59</style></volume><pages><style face="normal" font="default" size="100%">1958-1961</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Solid-liquid interface reaction technique (SLIRT) is used to deposit silver film on glass substrate. The solid film of silver nitrate is formed by modified spin coating method. This film is subsequently processed by dipping it in a reducing solution so as to initiate a reaction at the interface and ultimately transform it to totally silver film. In situ transformation of silver nitrate to silver is studied with respect to time spectrophotometrically. The characterization of silver film is done by various physicochemical techniques namely XRD, XPS, ED, TEM and UV visible spectroscopy. (c) 2005 Elsevier B.V. All rights reserved.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">14-15</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">&lt;p&gt;Foreign&lt;/p&gt;</style></custom3><custom4><style face="normal" font="default" size="100%">2.437</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Patil, Sheetal J.</style></author><author><style face="normal" font="default" size="100%">Bodas, Dhananjay S.</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Gangal, S. A.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Deposition of indium nitride films by activated reactive evaporation process - a feasibility study</style></title><secondary-title><style face="normal" font="default" size="100%">Applied Surface Science</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">activated reactive evaporation</style></keyword><keyword><style  face="normal" font="default" size="100%">ellipsometry</style></keyword><keyword><style  face="normal" font="default" size="100%">indium nitride</style></keyword><keyword><style  face="normal" font="default" size="100%">SEM</style></keyword><keyword><style  face="normal" font="default" size="100%">XRD</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2005</style></year><pub-dates><date><style  face="normal" font="default" size="100%">MAY</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">1-4</style></number><publisher><style face="normal" font="default" size="100%">ELSEVIER SCIENCE BV</style></publisher><pub-location><style face="normal" font="default" size="100%">PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS</style></pub-location><volume><style face="normal" font="default" size="100%">245</style></volume><pages><style face="normal" font="default" size="100%">73-78</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Indium nitride (InN) films are deposited by `activated reactive evaporation (ARE)' process using parallel plate coupled nitrogen plasma (radio frequency source of 13.56 MHz) and evaporation of pure indium powder by resistive heating. Depositions are carried out by varying RF plasma power, on n-type silicon &amp;amp;LANGBRAC; 1 0 0&amp;amp;RANGBRAC; substrate, maintained at room temperature, at a nitrogen gas pressure of 1.06 x 10(-1) Pa (8 x 10 (-4) Torr). The film's crystallinity was examined by X-ray diffraction (XRD) and topography by scanning electron microscope (SEM). The diffraction pattern shows polycrystalline nature of the deposited films with characteristics of hexagonal structure. XRD peak intensity increases with increase in power. SEM observations show a smooth and pinhole free surface having improved quality of film with hexagonal structure as the power is increased from 60 to 120 W. Primary X-ray photoelectron spectroscopy (XPS) results show binding energies of the In 3d levels and N 1s level matching well with that of stoichiometric InN. Further, the refractive index of the films, measured by ellipsometry, is in the range of η = 2.79-2.91 with the variation of plasma power, which is in good agreement with the standard value for indium nitride (η = 2.9). These results indicate the feasibility of using, `activated reactive evaporation (ARE)' process for indium nitride depositions on silicon &amp;amp;LANGBRAC; 1 0 0&amp;amp;RANGBRAC; substrates maintained at room temperature. © 2004 Elsevier B.V. All rights reserved.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">1-4</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">Foreign</style></custom3><custom4><style face="normal" font="default" size="100%">3.15</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Bodas, Dhananjay S.</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Gangal, S. A.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Deposition of PTFE thin films by RF plasma sputtering on &lt; 100 &gt; silicon substrates</style></title><secondary-title><style face="normal" font="default" size="100%">Applied Surface Science</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">Contact angle measurement</style></keyword><keyword><style  face="normal" font="default" size="100%">FTIR</style></keyword><keyword><style  face="normal" font="default" size="100%">PTFE</style></keyword><keyword><style  face="normal" font="default" size="100%">RF plasma sputtering</style></keyword><keyword><style  face="normal" font="default" size="100%">XPS</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2005</style></year><pub-dates><date><style  face="normal" font="default" size="100%">MAY</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">1-4</style></number><publisher><style face="normal" font="default" size="100%">ELSEVIER SCIENCE BV</style></publisher><pub-location><style face="normal" font="default" size="100%">PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS</style></pub-location><volume><style face="normal" font="default" size="100%">245</style></volume><pages><style face="normal" font="default" size="100%">202-207</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Polymers have been studied extensively due to the wonderful array of properties presented by them. Polymer materials can be coated/deposited by various techniques like sputtering (magnetron, ion beam, RF or dc), plasma polymerization, etc. and can be used in coatings, paint industries, etc. The present study deals with the RF sputter deposition of poly(tetrafluoro ethylene) (PTFE), commonly known as Teflon. Depositions were carried out on mirror polished silicon (1 0 0) substrates at different powers in the range of 100-200 W. The deposition time was kept constant at 60 min. The sputtered film shows lower contact angle of 50&amp;amp;DEG; with water and 44&amp;amp;DEG; with diiodomethane, a lower interfacial tension value of 0.76 dyne/cm, indicating hydrophilicity and good adhesion of the film with the substrate. FHR indicates presence of C-F, C-F-2 bonding groups in the deposited film. Further, XPS study shows presence of CF3 (292.2 eV), CF2 (290.8 eV), C-F (288.0 eV) and C-CF (286.4 eV) moieties indicating deposition of PTFE films at higher power levels of plasma. © 2004 Elsevier B.V. All rights reserved.&lt;/p&gt;</style></abstract><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">Foreign</style></custom3><custom4><style face="normal" font="default" size="100%">3.15</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Kulkarni, S. A.</style></author><author><style face="normal" font="default" size="100%">Mirji, S. A.</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Gupta, R. P.</style></author><author><style face="normal" font="default" size="100%">Vijayamohanan, K. P.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Growth kinetics and thermodynamic stability of octadecyltrichlorosilane self-assembled monolayer on Si (100) substrate</style></title><secondary-title><style face="normal" font="default" size="100%">Materials Letters</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">Gibbs's free energy (AG)</style></keyword><keyword><style  face="normal" font="default" size="100%">growth kinetics</style></keyword><keyword><style  face="normal" font="default" size="100%">octadecyltrichlorosilane (OTS)</style></keyword><keyword><style  face="normal" font="default" size="100%">self-assembled monolayers (SAMs)</style></keyword><keyword><style  face="normal" font="default" size="100%">Zisman plot</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2005</style></year><pub-dates><date><style  face="normal" font="default" size="100%">DEC</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">29-30</style></number><publisher><style face="normal" font="default" size="100%">ELSEVIER SCIENCE BV</style></publisher><pub-location><style face="normal" font="default" size="100%">PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS</style></pub-location><volume><style face="normal" font="default" size="100%">59</style></volume><pages><style face="normal" font="default" size="100%">3890-3895</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;We have studied the growth kinetics and thermodynamic stability of octadecyltrichlorosilane (OTS) self-assembled monolayers on Si (100) substrate in order to understand its role in controlling the adhesion and surface hydrophobicity. Time-dependent contact angle measurements, using water as a function of OTS concentration, show rapid monolayer formation in the initial stage followed by a slow attainment of full coverage and the overall kinetics approximately follows the Langmuir adsorption isotherm. The adsorption rate constant (k(a) = 150 M-1 s(-1)) is found to be significantly greater than the desorption rate constant (k(d) = 0.156 s(-1)) while the Gibbs free energy (Delta G(ads)) change amounts to -4.2 kcal/mol suggesting thermodynamic stability of OTS monolayer on a silicon surface. Partial monolayer formation by a `uniform' growth mechanism, even at low coverage, is revealed by atomic force microscopy (AFM) in conjunction with grazing angle FTIR spectroscopy. Analysis of the interfacial adhesion properties using Zisman plot suggests a critical surface tension (gamma(c)) of 20.7 dyn/cm for OTS monolayer on Si (100) surface. (C) 2005 Elsevier B.V. All rights reserved.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">29-30</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">&lt;p&gt;Foreign&lt;/p&gt;</style></custom3><custom4><style face="normal" font="default" size="100%">2.437</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Nikesh, V. V.</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Patil, K. R.</style></author><author><style face="normal" font="default" size="100%">Mahamuni, Shailaja</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">X-ray photoelectron spectroscopic investigations of Cu2O nanoparticles</style></title><secondary-title><style face="normal" font="default" size="100%">Materials Research Bulletin </style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">Nanostructures</style></keyword><keyword><style  face="normal" font="default" size="100%">Oxides</style></keyword><keyword><style  face="normal" font="default" size="100%">photoelectron spectroscopy</style></keyword><keyword><style  face="normal" font="default" size="100%">Surfaces</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2005</style></year><pub-dates><date><style  face="normal" font="default" size="100%">APR</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">4</style></number><publisher><style face="normal" font="default" size="100%">PERGAMON-ELSEVIER SCIENCE LTD</style></publisher><pub-location><style face="normal" font="default" size="100%">THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, ENGLAND</style></pub-location><volume><style face="normal" font="default" size="100%">40</style></volume><pages><style face="normal" font="default" size="100%">694-700</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Cuprous oxide nanoparticles of five different sizes were obtained by electrochemical as well as chemical routes. Various capping agents were used to passivate the nanoparticles. X-ray diffraction studies show formation of single phased, cubic Cu2O nanoparticles. X-ray photoelectron spectroscopic studies indicate formation of CuO phase on the surface of Cu2O nanoparticles for uncapped as well as for those, capped by tetraoctylammonium bromide. On the other hand polyacrylamide and polyvinyl pyrrolidone capped samples did not show presence of CuO. X-ray photoelectron spectroscopy also indicates formation of a Cu2+ complex with the capping material on the surface of Cu2O nanoparticles. The results were discussed in terms of capability of passivation of various additives. (c) 2005 Elsevier Ltd. All rights reserved.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">4</style></issue><custom3><style face="normal" font="default" size="100%">&lt;p&gt;Foreign&lt;/p&gt;</style></custom3><custom4><style face="normal" font="default" size="100%">2.435</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Mahapatra, S. K.</style></author><author><style face="normal" font="default" size="100%">Bodas, Dhananjay S.</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Gangal, S. A.</style></author><author><style face="normal" font="default" size="100%">Bhoraskar, Vasant N.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Electron beam induced surface cross-linking of functional monomers coated on silicon substrate</style></title><secondary-title><style face="normal" font="default" size="100%">Materials Letters</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">electron beam irradiation</style></keyword><keyword><style  face="normal" font="default" size="100%">FTIR</style></keyword><keyword><style  face="normal" font="default" size="100%">Polymers</style></keyword><keyword><style  face="normal" font="default" size="100%">surface modification</style></keyword><keyword><style  face="normal" font="default" size="100%">XPS</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2006</style></year><pub-dates><date><style  face="normal" font="default" size="100%">MAY</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">11</style></number><publisher><style face="normal" font="default" size="100%">ELSEVIER SCIENCE BV</style></publisher><pub-location><style face="normal" font="default" size="100%">PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS</style></pub-location><volume><style face="normal" font="default" size="100%">60</style></volume><pages><style face="normal" font="default" size="100%">1360-1365</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;A 3: 1 composition of functional monomer: multifunctional acrylate was spin coated and later cross-linked under the influence of keV electron irradiation on the surface of silicon to generate a surface-anchored cross-linked network bearing functional moieties. Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) as well as wetting angle measurements were used for the analysis of functional monomer cross-linked surfaces. Results of the surface reconstruction of surfaces and electron irradiated on coated silicon wafers reveal that long-term hydrophilic surfaces can be achieved. Thus, the surface architecture can be favorably manipulated by using this remarkable technique with a Suitable combination of functional monomers and cross-linkers. (c) 2005 Elsevier B.V. All rights reserved.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">11</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">&lt;p&gt;Foreign&lt;/p&gt;</style></custom3><custom4><style face="normal" font="default" size="100%">2.437</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Chaudhari, Sudeshna</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Patil, K. R.</style></author><author><style face="normal" font="default" size="100%">Sainkar, S. R.</style></author><author><style face="normal" font="default" size="100%">Patil, P. P.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Formation of poly(o-anisidine) coatings on copper from aqueous salicylate solution</style></title><secondary-title><style face="normal" font="default" size="100%">Surface &amp; Coatings Technology</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">conducting polymers</style></keyword><keyword><style  face="normal" font="default" size="100%">Copper</style></keyword><keyword><style  face="normal" font="default" size="100%">corrosion protective coatings</style></keyword><keyword><style  face="normal" font="default" size="100%">cyclic voltammetry</style></keyword><keyword><style  face="normal" font="default" size="100%">poly(o-anisidine) coatings</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2006</style></year><pub-dates><date><style  face="normal" font="default" size="100%">MAY</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">18-19</style></number><publisher><style face="normal" font="default" size="100%">ELSEVIER SCIENCE SA</style></publisher><pub-location><style face="normal" font="default" size="100%">PO BOX 564, 1001 LAUSANNE, SWITZERLAND</style></pub-location><volume><style face="normal" font="default" size="100%">200</style></volume><pages><style face="normal" font="default" size="100%">5557-5565</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Poly(o-anisidine) coatings have been electrosynthesized by using cyclic voltammetry on copper from an aqueous salicylate medium. Cyclic voltammetry, UV-visible absorption spectroscopy, Fourier transform infrared spectroscopy, scanning electron microscopy and X-ray photoelectron spectroscopy were used to characterize these coatings, which indicates that the aqueous salicylate solution is a suitable medium for the electrochemical polymerization of o-anisidine on copper substrate. Cyclic voltammetry accompanied by the X-ray photoelectron spectroscopy was used to characterize the surface modifications induced by polarizing the copper substrate in the aqueous salicylate solution (without monomer). It was shown that the polarization of the copper in the aqueous salicylate medium results into the passivation of its surface via the formation of Cu(2)O and/or copper salicylate complex. It was found that the electrochemical polymerization of o-anisidine takes place after the passivation of the copper substrate via fort-nation of Cu(2)O and/or copper salicylate complex and results into the formation of shiny, uniform and strongly adherent poly(o-anisidine). The optical absorption spectroscopy reveals the formation of emraldine salt form of poly(o-anisidine). This study offers an electrochemical polymerization recipe to synthesize strongly adherent poly(o-anisidine) coating on copper from aqueous media for possible use in corrosion protection application. (c) 2005 Elsevier B.V. All rights reserved.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">18-19</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">&lt;p&gt;Foreign&lt;/p&gt;</style></custom3><custom4><style face="normal" font="default" size="100%">2.139</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Majeed, Riyadh M A Abdul</style></author><author><style face="normal" font="default" size="100%">Purohit, V. S.</style></author><author><style face="normal" font="default" size="100%">Bhoraskar, S. V.</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Bhoraskar, Vasant N.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Irradiation effects of 12 eV oxygen ions on polyimide and fluorinated ethylene propylene</style></title><secondary-title><style face="normal" font="default" size="100%">Radiation Effects and Defects in Solids</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">atomic oxygen</style></keyword><keyword><style  face="normal" font="default" size="100%">ECR plasma</style></keyword><keyword><style  face="normal" font="default" size="100%">FEP</style></keyword><keyword><style  face="normal" font="default" size="100%">FTIR</style></keyword><keyword><style  face="normal" font="default" size="100%">Polyimide</style></keyword><keyword><style  face="normal" font="default" size="100%">SEM</style></keyword><keyword><style  face="normal" font="default" size="100%">weight loss</style></keyword><keyword><style  face="normal" font="default" size="100%">XPS</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2006</style></year><pub-dates><date><style  face="normal" font="default" size="100%">AUG</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">8</style></number><publisher><style face="normal" font="default" size="100%">TAYLOR &amp; FRANCIS LTD</style></publisher><pub-location><style face="normal" font="default" size="100%">4 PARK SQUARE, MILTON PARK, ABINGDON OX14 4RN, OXON, ENGLAND</style></pub-location><volume><style face="normal" font="default" size="100%">161</style></volume><pages><style face="normal" font="default" size="100%">495-504</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Polyimide (PI) and Fluorinated Ethylene Propylene (FEP) samples (15mm x 15mm x 50 mu m ) were exposed to atomic oxygen ions of average energy similar to 12 eV and flux similar to 5x10(13) ions cm(-2) s(-1) , produced in the Electron Cyclotron Resonance (ECR) plasma. The energy and the flux of the oxygen ions at different positions in the plasma were measured by a retarding field analyzer. The fluence of the oxygen ions was varied from sample to sample in the range of similar to 5x10(16) to 2x10(17) ions cm(-2) by changing the irradiation period. The pre- and the post-irradiated samples were characterized by the weight loss, Scanning Electron Microscopy (SEM), X-ray Photoelectron Spectroscopy (XPS), and Fourier Transform Infrared (FTIR) techniques. The weight of the PI and FEP samples decreased with increasing the ion fluence. However, the erosion yield for the PI is found to be higher, by almost a factor five, when compared with that of FEP. On the surface region of irradiated samples, the concentrations of the carbon, fluorine, and oxygen and their corresponding chemical bonds have changed appreciably. Moreover, blisters and nanoglobules were also observed even at a fluence of similar to 10(17) ions cm(-2) . This oxygen ion fluence is almost two orders of magnitude lower than that of the 5 eV atomic oxygen, which a satellite encounters in the space, at the low Earth orbit, during its mission period of about 7 years.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">8</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">&lt;p&gt;Foreign&lt;/p&gt;</style></custom3><custom4><style face="normal" font="default" size="100%">0.472</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Majeed, Riyadh M A Abdul</style></author><author><style face="normal" font="default" size="100%">Purohit, Vishwas</style></author><author><style face="normal" font="default" size="100%">Bhide, Rajesh</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Bhoraskar, S. V.</style></author><author><style face="normal" font="default" size="100%">Bhoraskar, Vasant N.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Nitridation of high speed steel by electron cyclotron resonance plasma</style></title><secondary-title><style face="normal" font="default" size="100%">Journal of Physics D-Applied Physics</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2006</style></year><pub-dates><date><style  face="normal" font="default" size="100%">MAY</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">10</style></number><publisher><style face="normal" font="default" size="100%">IOP PUBLISHING LTD</style></publisher><pub-location><style face="normal" font="default" size="100%">DIRAC HOUSE, TEMPLE BACK, BRISTOL BS1 6BE, ENGLAND</style></pub-location><volume><style face="normal" font="default" size="100%">39</style></volume><pages><style face="normal" font="default" size="100%">2109-2113</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Plasma nitridation of high speed M2 steel is studied using a microwave assisted electron cyclotron resonance plasma source. A mixture of hydrogen and nitrogen with a proportion of 7 : 3 was used as the nitriding gas. The density of plasma for this forming gas was measured to be similar to 10(18) m(-3) as estimated by a double probe method. The M2 steel was nitrided at various temperatures of 400, 450, 500 and 550 degrees C under similar reactor conditions. The nitrided layer was characterized by using various analytical techniques which included structural, morphological, chemical and microhardness measurement. The maximum thickness of the nitrided layer was found to be 48 mu m for samples nitrided at 550 degrees C. No layer corresponding to white/compound layer is seen in our analysis. The hardness is seen to increase from similar to 580HV to similar to 1190HV for samples nitrided at 550 degrees C. Electron cyclotron resonance plasma nitridation is observed to be much faster and a cleaner process as compared with the conventional nitriding process.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">10</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">&lt;p&gt;Foreign&lt;/p&gt;</style></custom3><custom4><style face="normal" font="default" size="100%">2.772</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Shinde, V.</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Patil, K. R.</style></author><author><style face="normal" font="default" size="100%">Gaikwad, A. B.</style></author><author><style face="normal" font="default" size="100%">Patil, P. P.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Poly(o-toluidine) coatings on copper: electrochemical synthesis from aqueous media</style></title><secondary-title><style face="normal" font="default" size="100%">Surface &amp; Coating Technology</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">Conducting polymer coatings</style></keyword><keyword><style  face="normal" font="default" size="100%">Copper</style></keyword><keyword><style  face="normal" font="default" size="100%">Corrosion resistant coatings</style></keyword><keyword><style  face="normal" font="default" size="100%">cyclic voltammetry</style></keyword><keyword><style  face="normal" font="default" size="100%">poly(o-toluidine) coatings</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2006</style></year><pub-dates><date><style  face="normal" font="default" size="100%">APR</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">16-17</style></number><publisher><style face="normal" font="default" size="100%">ELSEVIER SCIENCE SA</style></publisher><pub-location><style face="normal" font="default" size="100%">PO BOX 564, 1001 LAUSANNE, SWITZERLAND</style></pub-location><volume><style face="normal" font="default" size="100%">200</style></volume><pages><style face="normal" font="default" size="100%">5094-5101</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Poly(o-toluidine) (POT) coatings were synthesized on copper (Cu) by electrochemical polymerization of o-toluidine using aqueous sodium oxalate solution as supporting electrolyte. The resulting coatings were uniform, compact and strongly adherent to the Cu substrate. These coatings were characterized by using cyclic voltammetry, UV-visible absorption spectroscopy, Fourier transform infrared (FTIR) spectroscopy, scanning electron microscopy (SEM), X-ray diffraction (XRD) measurements and X-ray photoelectron spectroscopy (XPS). The results of these studies reveal that the sodium oxalate is suitable supporting electrolyte for the electrochemical polymerization of o-toluidine on Cu substrate. It is found that the electrochemical polymerization of o-toluidine takes place after the passivation of the Cu substrate via formation of copper oxalate (CuC2O4, H2O) layer, which is confirmed by XRD and XPS. The optical absorption spectroscopy study reveals the exclusive formation of the pernigraniline base (PB) form of POT. (c) 2005 Elsevier B.V. All rights reserved.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">16-17</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">&lt;p&gt;Foreign&lt;/p&gt;</style></custom3><custom4><style face="normal" font="default" size="100%">2.138</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Patil, K. R.</style></author><author><style face="normal" font="default" size="100%">Sathaye, S. D.</style></author><author><style face="normal" font="default" size="100%">Hawaldar, Ranjit R.</style></author><author><style face="normal" font="default" size="100%">Sathe, B. R.</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Mitra, A.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Copper phthalocyanine films deposited by liquid-liquid interface recrystallization technique (LLIRCT)</style></title><secondary-title><style face="normal" font="default" size="100%">Journal of Colloid and Interface Science</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">Copper phthalocyanine</style></keyword><keyword><style  face="normal" font="default" size="100%">cyclic voltametry</style></keyword><keyword><style  face="normal" font="default" size="100%">nanoparticulate films</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2007</style></year><pub-dates><date><style  face="normal" font="default" size="100%">NOV</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">2</style></number><publisher><style face="normal" font="default" size="100%">ACADEMIC PRESS INC ELSEVIER SCIENCE</style></publisher><pub-location><style face="normal" font="default" size="100%">525 B ST, STE 1900, SAN DIEGO, CA 92101-4495 USA</style></pub-location><volume><style face="normal" font="default" size="100%">315</style></volume><pages><style face="normal" font="default" size="100%">747-752</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;The simple recrystallization process is innovatively used to obtain the nanoparticles of copper phthalocyanine by a simple method. Liquid-liquid interface recrystallization technique (LLIRCT) has been employed successfully to produce small sized copper phthalocyanine nanoparticles with diameter between 3-5 nm. The TEM-SAED studies revealed the formation of 3-5 nm sized with beta-phase dominated mixture of alpha and beta copper phthalocyanine nanoparticles. The XRD, SEM, and the UV-vis studies were further carried out to confirm the formation of copper phthalocyanine thin films. The cyclic voltametry (CV) studies conclude that redox reaction is totally reversible one electron transfer process. The process is attributed to Cu(II)/Cu(I) redox reaction. (C) 2007 Elsevier Inc. All rights reserved.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">2</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">Foreign</style></custom3><custom4><style face="normal" font="default" size="100%">3.782</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Chaudhari, Sudeshna</style></author><author><style face="normal" font="default" size="100%">Patil, P. P.</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Patil, K. R.</style></author><author><style face="normal" font="default" size="100%">Sainkar, S. R.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Use of poly(o-toluidine)/ZrO2 nanocomposite coatings for the corrosion protection of mild steel</style></title><secondary-title><style face="normal" font="default" size="100%">Journal of Applied Polymer Science</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">Coatings</style></keyword><keyword><style  face="normal" font="default" size="100%">conjugated polymers</style></keyword><keyword><style  face="normal" font="default" size="100%">FTIR</style></keyword><keyword><style  face="normal" font="default" size="100%">Nanocomposites</style></keyword><keyword><style  face="normal" font="default" size="100%">synthesis</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2007</style></year><pub-dates><date><style  face="normal" font="default" size="100%">OCT</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">1</style></number><publisher><style face="normal" font="default" size="100%">JOHN WILEY &amp; SONS INC</style></publisher><pub-location><style face="normal" font="default" size="100%">111 RIVER ST, HOBOKEN, NJ 07030 USA</style></pub-location><volume><style face="normal" font="default" size="100%">106</style></volume><pages><style face="normal" font="default" size="100%">220-229</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;This study explored the possibility of using poly(o-toluidine) (POT)/ZrO2 nanocomposite coatings for the corrosion protection of mild steel in a chloride environment. POT/ZrO2 nanocomposite coatings were synthesized on steel substrates through an electrochemical route. These coatings were characterized with cyclic voltammetry, ultraviolet-visible absorption spectroscopy, Fourier transform infrared spectroscopy, scanning electron microscopy, and X-ray photoelectron spectroscopy. The performance of POT/ZrO2 nanocomposites as protective coatings against the corrosion of mild steel in aqueous 3 wt % NaCl was evaluated with the potentiodynamic polarization technique and electrochemical impedance spectroscopy. The results of this study demonstrate that POT/ZrO2 nanocomposite coatings provide better protection for mild steel against corrosion than pure POT coatings. The corrosion potential was about 0.312 V versus a saturated calomel electrode, more positive in aqueous 3 wt % NaCl for the nanocomposite-coated steel than the uncoated steel, and the corrosion rate of steel was reduced by a factor of almost 51. (c) 2007 Wiley Periodicals, Inc.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">1</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">Foreign</style></custom3><custom4><style face="normal" font="default" size="100%">1.866</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Gambhire, A. B.</style></author><author><style face="normal" font="default" size="100%">Lande, Machhindra K.</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Patil, K. R.</style></author><author><style face="normal" font="default" size="100%">Arbad, B. R.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Photocatalytic activity and characterization of sol-gel-derived Cr(III)-doped TiO(2)-coated active carbon composites</style></title><secondary-title><style face="normal" font="default" size="100%">Philosophical Magazine</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">EDTA</style></keyword><keyword><style  face="normal" font="default" size="100%">photoactive</style></keyword><keyword><style  face="normal" font="default" size="100%">sol-gel</style></keyword><keyword><style  face="normal" font="default" size="100%">Titanium dioxide</style></keyword><keyword><style  face="normal" font="default" size="100%">XPS</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2008</style></year><pub-dates><date><style  face="normal" font="default" size="100%">APR</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">5</style></number><publisher><style face="normal" font="default" size="100%">TAYLOR &amp; FRANCIS LTD</style></publisher><pub-location><style face="normal" font="default" size="100%">4 PARK SQUARE, MILTON PARK, ABINGDON OX14 4RN, OXON, ENGLAND</style></pub-location><volume><style face="normal" font="default" size="100%">88</style></volume><pages><style face="normal" font="default" size="100%">767-779</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Cr(III)-doped, TiO(2)-coated active carbon (Cr-TiO(2)/AC) were prepared by a sol-gel method. The effect of supports, including TiO(2) and active carbon (AC), on the molecular structure and photocatalytic activity of chromium oxide for complete decomposition of EDTA has been examined with respect to the content of Cr on the catalyst surface. The photocatalytic activity of the Cr-TiO(2)/AC composites was evaluated in the decomposition of EDTA solution under UV irradiation. The results indicate that Cr-TiO(2)/AC has a higher efficiency in decomposition of EDTA than TiO(2), TiO(2)/AC or active carbon. This was attributed to the different functions of active carbon and chromate species. (1) Nanosize TiO(2) particles on composites were not reunited, possible because active carbon retards transformation of anatase into rutile and decreases the crystallite size. (2) Production of high concentrations of organic compound near Cr-TiO(2). (3) Carbon in active carbon causes some of the TiO(2) to reduce to Ti(3+) ions, which prevents electron-hole pair recombination. (4) Formation of polychromate species, with a stronger redox capability, on the surface of TiO(2)/AC. It was found that the addition of Cr to TiO(2) sol could suppress the grain growth of TiO(2) crystals and increase the hydroxyl content on the surface of TiO(2)/AC. The photocatalytic efficiency and activity of the composites remained good, even after three cycles.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">5</style></issue><custom3><style face="normal" font="default" size="100%">Foreign</style></custom3><custom4><style face="normal" font="default" size="100%">1.302</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Gambhire, A. B.</style></author><author><style face="normal" font="default" size="100%">Lande, Machhindra K.</style></author><author><style face="normal" font="default" size="100%">Kalokhe, S. B.</style></author><author><style face="normal" font="default" size="100%">Mandale, A. B.</style></author><author><style face="normal" font="default" size="100%">Patil, K. R.</style></author><author><style face="normal" font="default" size="100%">Gholap, Ramkrishna S.</style></author><author><style face="normal" font="default" size="100%">Arbad, B. R.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Synthesis and characterizations of NiTiO(3) nanoparticles prepared by the sol-gel process</style></title><secondary-title><style face="normal" font="default" size="100%">Philosophical Magazine Letters</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">Nanoparticles</style></keyword><keyword><style  face="normal" font="default" size="100%">nickel titanate</style></keyword><keyword><style  face="normal" font="default" size="100%">sol-gel process</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2008</style></year><pub-dates><date><style  face="normal" font="default" size="100%">MAR</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">6</style></number><publisher><style face="normal" font="default" size="100%">TAYLOR &amp; FRANCIS LTD</style></publisher><pub-location><style face="normal" font="default" size="100%">4 PARK SQUARE, MILTON PARK, ABINGDON OX14 4RN, OXON, ENGLAND</style></pub-location><volume><style face="normal" font="default" size="100%">88</style></volume><pages><style face="normal" font="default" size="100%">467-472</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Nanocrystalline nickel titanate (NiTiO(3)) composite powders were prepared by the sol-gel process combined with a surfactant-assisted template method. The resulting powders were calcined at different temperatures ranging from 150 degrees C to 750 degrees C for 2 h in air. The results revealed that a pure hexagonal phase of NiTiO(3) could be obtained at the low temperature of 750 degrees C. The phase evolution of NiTiO(3) was investigated by X-ray diffraction patterns, Fourier-transform infrared spectroscopy, and X-ray photoelectron spectroscopy. Particle size and morphology were studied by transmission electron microscopy.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">6</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">Foreign</style></custom3><custom4><style face="normal" font="default" size="100%">0.918</style></custom4></record></records></xml>