<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Hankare, P. P.</style></author><author><style face="normal" font="default" size="100%">Patil, A. A.</style></author><author><style face="normal" font="default" size="100%">Chate, P. A.</style></author><author><style face="normal" font="default" size="100%">Garadkar, K. M.</style></author><author><style face="normal" font="default" size="100%">Sathe, D. J.</style></author><author><style face="normal" font="default" size="100%">Manikshete, A. H.</style></author><author><style face="normal" font="default" size="100%">Mulla, Imtiaz S.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Characterization of MoSe2 thin film deposited at room temperature from solution phase</style></title><secondary-title><style face="normal" font="default" size="100%">Journal of Crystal Growth</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">Crystal morphology</style></keyword><keyword><style  face="normal" font="default" size="100%">Growth from solution</style></keyword><keyword><style  face="normal" font="default" size="100%">Inorganic compound</style></keyword><keyword><style  face="normal" font="default" size="100%">Polycrystalline deposition</style></keyword><keyword><style  face="normal" font="default" size="100%">Semiconducting materials</style></keyword><keyword><style  face="normal" font="default" size="100%">X-ray diffraction</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2008</style></year><pub-dates><date><style  face="normal" font="default" size="100%">DEC</style></date></pub-dates></dates><number><style face="normal" font="default" size="100%">1</style></number><publisher><style face="normal" font="default" size="100%">ELSEVIER SCIENCE BV</style></publisher><pub-location><style face="normal" font="default" size="100%">PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS</style></pub-location><volume><style face="normal" font="default" size="100%">311</style></volume><pages><style face="normal" font="default" size="100%">15-19</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;A simple, low-temperature method has been developed to synthesis molybdenum diselenide semiconductor thin films, based on the chemical reaction of conlplexed ammonium molybdate, hydrazine hydrate and sodium Selenosulphate in aqueous alkaline medium. The deposition parameter of the MoSe2 thin film is interpreted in the present investigation. The films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), optical absorption and electrical measurements. The deposited film was found to be polycrystalline in hexagonal form. The direct band gap `E-g' for the film was found to be 1.43eV and electrical conductivity in the order of 10(-2)(Omega cm)(-1) with n-type conduction mechanism. (C) 2008 Elsevier B.V. All rights reserved.&lt;/p&gt;</style></abstract><issue><style face="normal" font="default" size="100%">1</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">Foreign</style></custom3><custom4><style face="normal" font="default" size="100%">1.462</style></custom4></record></records></xml>