<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Gawande, Akshay J.</style></author><author><style face="normal" font="default" size="100%">Kamble, Ganesh N.</style></author><author><style face="normal" font="default" size="100%">Singh, Dharmendra</style></author><author><style face="normal" font="default" size="100%">Sanjayan, Gangadhar. J.</style></author><author><style face="normal" font="default" size="100%">Nair, Kiran Sukumaran</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Triple G-C-T base-coded nucleobase self-assembling monomers featuring polymerizable groups for 3D printing</style></title><secondary-title><style face="normal" font="default" size="100%">ACS Applied Polymer Materials</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">3D printing</style></keyword><keyword><style  face="normal" font="default" size="100%">hydrogen bonding</style></keyword><keyword><style  face="normal" font="default" size="100%">Self-assembly</style></keyword><keyword><style  face="normal" font="default" size="100%">Self-healing</style></keyword><keyword><style  face="normal" font="default" size="100%">Triple G-C-T nucleobase</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2025</style></year><pub-dates><date><style  face="normal" font="default" size="100%">NOV</style></date></pub-dates></dates><volume><style face="normal" font="default" size="100%">7</style></volume><pages><style face="normal" font="default" size="100%">15619-15628</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;
	Self-assembling monomers (SAMs) offer a versatile strategy for enhancing the performance of photoresins in Digital Light Processing (DLP) 3D printing. In this work, we report the design and synthesis of two photoprintable, nucleobase-inspired SAMs featuring a triple G-C-T base-coded hydrogen-bonding motif. This SAM was formulated using 2-hydroxyethyl acrylate (2-HEA), 1,6-hexanediol diacrylate (HDDA), and diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide (TPO) to prepare UV-curable resins suitable for high-resolution DLP printing. Remarkably, the printed samples exhibited supramolecular self-assembly, facilitated by dynamic hydrogen bonding, demonstrating a notable enhancement in thermal and mechanical performance when compared to the control sample. Thermal properties evaluated by a differential scanning calorimeter revealed an increase in the glass transition temperature (T-g) from 15 degrees C to 54 degrees C for SAM-incorporated printed materials. Mechanical testing demonstrated a &amp;gt;200% increase in toughness and &amp;gt;150% improvement in tensile strength relative to the unmodified resin while maintaining or exceeding the original elongation at break (up to similar to 74%). Variable-temperature FTIR spectroscopy confirmed the presence of thermally responsive supramolecular interactions. Notably, self-healing behavior was observed in both GCT-A 15 wt % and GCT-S 15 wt % formulations, indicating partial recovery of mechanical integrity under mild thermal conditions due to reversible hydrogen bonding. These findings demonstrate the potential of SAMs as functional additives for developing robust, thermally stable, and self-healing DLP-printed materials for advanced engineering applications.&lt;/p&gt;
</style></abstract><issue><style face="normal" font="default" size="100%">22</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">&lt;p&gt;
	Foreign&lt;/p&gt;
</style></custom3><custom4><style face="normal" font="default" size="100%">&lt;p&gt;
	5.0&lt;/p&gt;
</style></custom4></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Gawande, Akshay J.</style></author><author><style face="normal" font="default" size="100%">Davis, Disiya</style></author><author><style face="normal" font="default" size="100%">Wagh, Mahendra A.</style></author><author><style face="normal" font="default" size="100%">Nair, Kiran Sukumaran</style></author><author><style face="normal" font="default" size="100%">Sanjayan, Gangadhar J.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Photolabile-protected triazine-based janus G-C and Triple G-C-T base-coded nucleobases for supramolecular polymer construction</style></title><secondary-title><style face="normal" font="default" size="100%">Journal of Organic Chemistry</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2026</style></year><pub-dates><date><style  face="normal" font="default" size="100%">JUN</style></date></pub-dates></dates><volume><style face="normal" font="default" size="100%">91</style></volume><pages><style face="normal" font="default" size="100%">8085-8095</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;
	Janus self-assembling systems show unique behavior due to their dual-sided nature, enabling precise control over the assembly patterns and functional properties. Herein, we report the design and synthesis of photolabile-protected triazine-based nucleobase monomers featuring both Janus G-C and triple G-C-T base-coded motifs. These monomers, derived from DDA (G mimic), DAA (C mimic), and ADA (T mimic) arrays, possess polymerizable functionalities and self-complementary triple hydrogen-bonding sites. The O-nitrobenzyl (O-NB) protecting group imparts exceptional stability under both acidic and basic conditions, thereby enabling diverse polymerization conditions. A representative triple G-C-T monomer was polymerized via free-radical polymerization to yield the corresponding protected polymer, which, upon UV-induced deprotection, regenerated active hydrogen-bonding sites and triggered supramolecular self-assembly, as evidenced by enhanced mechanical performance. This study establishes a versatile synthetic platform for constructing nucleobase-derived Janus monomers with orthogonal reactivity and photochemically switchable supramolecular organizations.&lt;/p&gt;
</style></abstract><issue><style face="normal" font="default" size="100%">24</style></issue><work-type><style face="normal" font="default" size="100%">Article</style></work-type><custom3><style face="normal" font="default" size="100%">&lt;p&gt;
	Foreign&lt;/p&gt;
</style></custom3><custom4><style face="normal" font="default" size="100%">&lt;p&gt;
	3.3&lt;/p&gt;
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