<style face="normal" font="default" size="100%">Influence of process pressure on HW-CVD deposited a-Si : H films</style>

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<style face="normal" font="default" size="100%">Influence of process pressure on HW-CVD deposited a-Si : H films</style>

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17

<style face="normal" font="default" size="100%">Temperature-dependent raman spectroscopy of titanium trisulfide (TiS3) nanoribbons and nanosheets</style>