P.  Laha, Panda, A. B., Dahiwale, S., Date, K. S., Patil, K. R., Barhai, P. K., Das, A. K., Banerjee, I., and Mahapatra, S. K., ?Effect of leakage current and dielectric constant on single and double layer oxides in MOS structure?, Thin Solid Films, vol. 519, no. 5, pp. 1530-1535, 2010.