{\rtf1\ansi\deff0\deftab360

{\fonttbl
{\f0\fswiss\fcharset0 Arial}
{\f1\froman\fcharset0 Times New Roman}
{\f2\fswiss\fcharset0 Verdana}
{\f3\froman\fcharset2 Symbol}
}

{\colortbl;
\red0\green0\blue0;
}

{\info
{\author Biblio 7.x}{\operator }{\title Biblio RTF Export}}

\f1\fs24
\paperw11907\paperh16839
\pgncont\pgndec\pgnstarts1\pgnrestart
P.  Laha, Panda, A. B., Dahiwale, S., Date, K. S., Patil, K. R., Barhai, P. K., Das, A. K., Banerjee, I., and Mahapatra, S. K., ?Effect of leakage current and dielectric constant on single and double layer oxides in MOS structure?, Thin Solid Films, vol. 519, no. 5, pp. 1530-1535, 2010.\par \par }