01555nas a2200217   4500008004100000022001400041245010400055210006900159260007300228300001200301490000800313520076100321653001601082653001701098653002701115653001801142653001801160653001801178100001601196856012501212       2005                        eng d  a0040-603100aPressure dependence of the dissociation of acetic, benzoic, mandelic and succinic acids at 298.15 K0 aPressure dependence of the dissociation of acetic benzoic mandel  aPO BOX 211, 1000 AE AMSTERDAM, NETHERLANDSbELSEVIER SCIENCE BVcDEC  a154-1570 v4393 a<p>Dissociation constants for acetic, benzoic, mandelic and succinic acids have been measured at 298.15 K as a function of pressure up to 138.8 MPa. The spectrophotometric technique using Bromocresol Green as the optical indicator was employed up to ionic strength of 0.03 mol kg(-1) in aqueous solution. Thermodynamic dissociation constants were calculated with the Davies activity coefficient equation. The pressure dependences of the ionization constants for the weak acids can be described by the equation of Lown, Thirsk and Wynne-Jones, application of which leads to accurate partial molal volume change on ionization, Delta(V) over bar (o) and compressibility change, Delta(K) over bar (o) at 0.1 MPa. (C) 2005 Elsevier B.V. All rights reserved.</p>10aAcetic acid10abenzoic acid10adissociation constants10ahigh pressure10amandelic acid10asuccinic acid1 aKumar, Anil  uhttps://library.ncl.res.in/content/pressure-dependence-dissociation-acetic-benzoic-mandelic-and-succinic-acids-29815-k-002134nas a2200277   4500008004100000022001200041245010700053210006900160260000900229300001200238490000700250520121100257653001301468653001801481653001101499653002801510653002301538100002201561700001901583700002501602700002401627700002701651700002601678700002401704856012801728       2018                        eng d  a925963500aTemperature and pressure dependent Raman spectroscopy of plasma treated multilayer graphene nanosheets0 aTemperature and pressure dependent Raman spectroscopy of plasma   cAPR   a146-1560 v843 a<p>Understanding of the fine structure at the atomic level and properties of graphene by creating defects is important from the point of view of thermal and stress management. Here we report Raman spectroscopic studies on pristine and plasma treated multilayer graphene to explore the remarkable structure and phonon properties with temperature and pressure. Temperature dependent studies illustrate monotonic softening of G and G′ bands in the temperature range 78 to 573 K. This process can be of fundamental importance in other promising and emerging nano and heterostructured materials. The pressure dependent Raman spectroscopic investigations on G-band of these samples were carried out up to 25 GPa using a diamond anvil cell. Comparatively weak and more compressible nature of the G band (E2g in-plane mode) as a function of applied pressure is found in plasma treated graphene. After pressure release, the samples recover to their original ordered structure. The present study is important for further understanding of the fine structure, properties and effect of defects in graphene, which can affect the atomic bonds, thermal expansion, specific heat, and thermal conductivity as well.</p>10agraphene10ahigh pressure10aPhonon10aPlasma treated graphene10aRaman spectroscopy1 aPawbake, Amit, S.1 aMishra, K., K.1 aMachuno, Luis, G. B.1 aGelamo, Rogerio, V.1 aRavindranathan, T., R.1 aRout, Chandra, Sekhar1 aLate, Dattatray, J.  uhttps://library.ncl.res.in/content/temperature-and-pressure-dependent-raman-spectroscopy-plasma-treated-multilayer-graphene