02418nas a2200241   4500008004100000022001400041245010300055210006900158260007300227300001000300490000800310520155400318653003501872653001701907653001901924653000801943653000801951100002301959700002501982700002002007700001902027856013002046       2005                        eng d  a0169-433200aDeposition of indium nitride films by activated reactive evaporation process - a feasibility study0 aDeposition of indium nitride films by activated reactive evapora  aPO BOX 211, 1000 AE AMSTERDAM, NETHERLANDSbELSEVIER SCIENCE BVcMAY  a73-780 v2453 a<p>Indium nitride (InN) films are deposited by `activated reactive evaporation (ARE)' process using parallel plate coupled nitrogen plasma (radio frequency source of 13.56 MHz) and evaporation of pure indium powder by resistive heating. Depositions are carried out by varying RF plasma power, on n-type silicon &amp;LANGBRAC; 1 0 0&amp;RANGBRAC; substrate, maintained at room temperature, at a nitrogen gas pressure of 1.06 x 10(-1) Pa (8 x 10 (-4) Torr). The film's crystallinity was examined by X-ray diffraction (XRD) and topography by scanning electron microscope (SEM). The diffraction pattern shows polycrystalline nature of the deposited films with characteristics of hexagonal structure. XRD peak intensity increases with increase in power. SEM observations show a smooth and pinhole free surface having improved quality of film with hexagonal structure as the power is increased from 60 to 120 W. Primary X-ray photoelectron spectroscopy (XPS) results show binding energies of the In 3d levels and N 1s level matching well with that of stoichiometric InN. Further, the refractive index of the films, measured by ellipsometry, is in the range of η = 2.79-2.91 with the variation of plasma power, which is in good agreement with the standard value for indium nitride (η = 2.9). These results indicate the feasibility of using, `activated reactive evaporation (ARE)' process for indium nitride depositions on silicon &amp;LANGBRAC; 1 0 0&amp;RANGBRAC; substrates maintained at room temperature. © 2004 Elsevier B.V. All rights reserved.</p>10aactivated reactive evaporation10aellipsometry10aindium nitride10aSEM10aXRD1 aPatil, Sheetal, J.1 aBodas, Dhananjay, S.1 aMandale, A., B.1 aGangal, S., A.  uhttps://library.ncl.res.in/content/deposition-indium-nitride-films-activated-reactive-evaporation-process-feasibility-study-0