02128nas a2200253 4500008004100000022001400041245011800055210006900173260009500242300001200337490000800349520114900357653002301506653001401529653002301543653003501566653001801601653003501619100002101654700002801675700002201703700001901725856013001744 2006 eng d a0021-979700aSuppression of electron-transfer characteristics of ferrocene by OTS monolayer on a silicon/electrolyte interface0 aSuppression of electrontransfer characteristics of ferrocene by  a525 B ST, STE 1900, SAN DIEGO, CA 92101-4495 USAbACADEMIC PRESS INC ELSEVIER SCIENCEcJUL a777-7840 v2993 a

The passivating behavior of self-assembled monolayers (SAMs) of octadecyltrichlorosilane (OTS) on an n-type Si(100) electrode with and without a redox species like ferrocene in a polar non-aqueous medium has been investigated using techniques like contact angle measurements, Fourier transform infrared (FTIR) spectroscopy and X-ray photoelectron spectroscopy (XPS) to understand the role of the monolayer. The electron-transfer behavior of ferrocene is found to be drastically affected by the presence of monolayer and the reasons for these are analyzed as a function of the change in resistance, dielectric thickness and coverage of the monolayer. Electrochemical impedance analysis in the presence of ferrocene gives the monolayer coverage as 0.998 and the apparent rate constant calculated from this gives 4.85 x 10(-12) cm s(-1) in comparison with 4.4 x 10(-8) cm s(-1) for a similar electrode without any monolayer. A positive shift of 200 mV in the flat-band potential after monolayer formation also suggests the covalent coupling of the silane nionolayer offering a protective barrier. (c) 2006 Elsevier Inc. All rights reserved.

10acyclic voltammetry10aferrocene10aimpedance analysis10aoctadecyltrichlorosilane (OTS)10arate constant10aself-assembled monolayer (SAM)1 aKulkarni, S., A.1 aKakade, Bhalchandra, A.1 aMulla, Imtiaz, S.1 aPillai, V., K. uhttps://library.ncl.res.in/content/suppression-electron-transfer-characteristics-ferrocene-ots-monolayer-siliconelectrolyte-002393nas a2200253 4500008004100000022001400041245010600055210006900161260007300230300001200303490000700315520145300322653003101775653002801806653002201834653002201856653002001878100002901898700001801927700001401945700002801959700002601987856012602013 2007 eng d a1387-181100aSynthesis and characterization of mesoporous carbon through inexpensive mesoporous silica as template0 aSynthesis and characterization of mesoporous carbon through inex aPO BOX 211, 1000 AE AMSTERDAM, NETHERLANDSbELSEVIER SCIENCE BVcJAN a189-1990 v983 a

Mesoporous silica materials have been synthesized through sol-gel reaction using inexpensive sodium silicate as source of silica and low cost hydroxy carboxylic acid compounds as templates/pore forming agents. The material measured surface area of 1014 m(2)/g, pore diameter of 65 angstrom and pore volume of 1.4 cc/g when parameters like time and temperature of synthesis along with mole ratio of TA/SiO(2) were optimized. Here TA stands for tartaric acid. Carbonization of sucrose inside the pores of above silica material at 900 degrees C followed by removal of silica framework using aqueous ethanoic solution of NaOH gave rise to mesoporous carbon material. The resulting materials were characterized by N(2)-sorption, FTIR spectroscopy, X-ray diffraction, transmission electron microscopy, X-ray photoelectron spectroscopy, thermal analysis and cyclic voltammetry. Three dimensional interconnecting wormhole channel arrangement of mesoporous silica template leads to mesoporous carbon replica with surface area of 1200 m(2)/g. X-ray photoelectron spectroscopic study (XPS) of the mesoporous carbon material shows the concentration of carbon atom in the range of 97-98% with 1-2% oxygen and negligible amount of silica. The electrochemical double layer capacitance behavior of carbon material with the specific capacitance value of 88.0 F/g at the scan rate of 1 mV/s appears to be promising. (C) 2006 Elsevier Inc. All rights reserved.

10aElectrochemical properties10ahydroxy carboxylic acid10amesoporous carbon10aMesoporous silica10asodium silicate1 aKarandikar, Prashant, R.1 aPatil, K., R.1 aMitra, A.1 aKakade, Bhalchandra, A.1 aChandwadkar, Asha, J. uhttps://library.ncl.res.in/content/synthesis-and-characterization-mesoporous-carbon-through-inexpensive-mesoporous-silica01210nas a2200193 4500008004100000022001400041245010900055210006900164260011000233300001400343490000700357520040500364100002300769700002800792700001900820700002000839700003000859856012700889 2010 eng d a1359-734500aSynthesis of Rh-carbon nanotube based heterostructures and their enhanced field emission characteristics0 aSynthesis of Rhcarbon nanotube based heterostructures and their  aTHOMAS GRAHAM HOUSE, SCIENCE PARK, MILTON RD, CAMBRIDGE CB4 0WF, CAMBS, ENGLANDbROYAL SOC CHEMISTRYcJUL a5671-56730 v463 a

Selective decoration of Rh nanospheres on acid functionalized carbon nanotubes has been demonstrated using Al as a sacrificial substrate. Remarkable field emission has been observed for this heterostructure as a high current density of 170 mu A cm(-2) is generated at an ultra-low threshold of 300 V mu m(-1), compared to much smaller values for Rh nanospheres and carbon nanotubes separately.

1 aSathe, Bhaskar, R.1 aKakade, Bhalchandra, A.1 aKushwaha, Ajay1 aAslam, Mohammed1 aPillai, Vijayamohanan, K. uhttps://library.ncl.res.in/content/synthesis-rh-carbon-nanotube-based-heterostructures-and-their-enhanced-field-emission-0