01635nas a2200253   4500008004100000022001400041245009400055210006900149260006900218300001200287490000800299520075400307653001901061653001901080653001501099653002201114100002001136700001901156700002101175700001801196700002201214700002001236856012501256       2010                        eng d  a0925-838800aSynthesis and characterization of nickel selenide thin films deposited by chemical method0 aSynthesis and characterization of nickel selenide thin films dep  aPO BOX 564, 1001 LAUSANNE, SWITZERLANDbELSEVIER SCIENCE SAcFEB  a228-2310 v4903 a<p>Nickel selenide thin films have been deposited using chemical bath method on non-conducting glass substrates in a tartarate bath containing nickel sulphate octahydrate, hydrazine hydrate, sodium seleno-sulphate in an aqueous alkaline medium. The grown films were uniform, well adherent and black in color. The films were characterized using X-ray diffraction, scanning electron microscopy, optical absorption and electrical measurements. The nickel selenide thin film revealed polycrystalline nature with hexagonal system. The direct optical band gap of the film was found to be 1.61 eV. Electrical resistivity of film was observed in the order of 10(3) (Omega cm) with p-type conduction mechanism. (C) 2009 Elsevier B.V. All rights reserved.</p>10aCrystal growth10aSemiconductors10aThin films10aX-ray diffraction1 aHankare, P., P.1 aJadhav, B., V.1 aGaradkar, K., M.1 aChate, P., A.1 aMulla, Imtiaz, S.1 aDelekar, S., D.  uhttps://library.ncl.res.in/content/synthesis-and-characterization-nickel-selenide-thin-films-deposited-chemical-method-001683nas a2200241   4500008004100000022001400041245009300055210006900148260006900217300001400286490000800300520082500308653002301133653001901156653002801175653001401203100002001217700001901237700001801256700001801274700002201292856012701314       2011                        eng d  a0925-838800aSynthesis and characterization of chemically deposited nickel substituted CdSe thin film0 aSynthesis and characterization of chemically deposited nickel su  aPO BOX 564, 1001 LAUSANNE, SWITZERLANDbELSEVIER SCIENCE SAcFEB  a2948-29510 v5093 a<p>The technologically important Cd(0.5)Ni(0.5)Se thin film has been developed by solution growth technique on non-conducting glass substrate in tartarate bath containing Cd(+2), Ni(+2) ions and sodium selenosulphate in an aqueous alkaline medium at room temperature. Various preparative conditions of the thin films are outlined. The films were characterized by X-ray diffraction, scanning electron microscope, optical absorption and electrical measurements. The X-ray diffraction study indicates that the film is polycrystalline in nature with hexagonal phase. Scanning electron micrograph shows that the film is homogeneous with well-defined grains. The films have high optical absorption coefficient. Thermoelectric power measurement shows p-type conduction mechanism. (C) 2010 Elsevier B.V. All rights reserved.</p>10aChemical synthesis10aCrystal growth10aElectrical conductivity10athin film1 aHankare, P., P.1 aJadhav, B., V.1 aChate, P., A.1 aSathe, D., J.1 aMulla, Imtiaz, S.  uhttps://library.ncl.res.in/content/synthesis-and-characterization-chemically-deposited-nickel-substituted-cdse-thin-film-0