01682nas a2200277   4500008004100000022001400041245004800055210004800103260006900151300001400220490000800234520082400242653001901066653002001085653003301105653001401138100002201152700002401174700002301198700002301221700001901244700002001263700002001283700002101303856008001324       2006                        eng d  a0040-609000aField emission from oriented tin oxide rods0 aField emission from oriented tin oxide rods  aPO BOX 564, 1001 LAUSANNE, SWITZERLANDbELSEVIER SCIENCE SAcDEC  a1450-14540 v5153 a<p>Tin oxide (SnO2) films were grown on silicon substrates by a wet chemical route. It was found from scanning electron microscopy investigations that oriented SnO2 rods normal to the substrates were obtained. Field emission studies were carried out in diode configuration in an all metal ultra high vacuum chamber at a base pressure similar to 1.33 x 10(-8) mbar. The `onset' field required to draw 0.1 mu A/cm(2) current density from the emitter cathode was found to be similar to 3.4 V/mu m for SnO2 rods. The field emission current and applied field follows the Folwer-Nordheim relationship in low field regime. The observed results indicate that the field emission characteristics of chemically grown SnO2 structures are comparable to the vapor grown nanostructures. (c) 2006 Elsevier B.V. All rights reserved.</p>10afield emission10amicrostructures10ascanning electron microscopy10atin oxide1 aDeshpande, A., C.1 aKoinkar, Pankaj, M.1 aAshtaputre, S., S.1 aMore, Mahendra, A.1 aGosavi, S., W.1 aGodbole, P., D.1 aJoag, Dilip, S.1 aKulkarni, S., K.  uhttps://library.ncl.res.in/content/field-emission-oriented-tin-oxide-rods-001795nas a2200265   4500008004100000022001400041245011000055210006900165260006900234300001400303490000800317520082400325653001401149653002201163653001401185653002201199653003301221653003701254653001501291100002601306700002201332700002001354700002301374856013201397       2009                        eng d  a0040-609000aInfluence of process variables on growth of ZnO nanowires by cathodic electrodeposition on zinc substrate0 aInfluence of process variables on growth of ZnO nanowires by cat  aPO BOX 564, 1001 LAUSANNE, SWITZERLANDbELSEVIER SCIENCE SAcOCT  a6605-66110 v5173 a<p>Influence of the deposition duration and electrolyte concentration on the structural and morphological features of the ZnO thin films, grown by cathodic electrodeposition on zinc substrate followed by annealing in air at 400 degrees C, have been investigated. The surface morphology of the as-synthesized films shows two distinct features, presence of `2-dimensional nanosheets' on the area near the electrolyte-air interface and `granular' nanostructures, below the interface region. However, upon annealing, the formation of ZnO nanowires, possessing length of several microns and diameter less than 20 nm, on the entire substrate is observed. The X-ray and selected area electron diffraction patterns clearly confirm the polycrystalline nature of the ZnO nanowires. (C) 2009 Elsevier B.V. All rights reserved.</p>10aAnnealing10aElectrodeposition10aNanowires10aphotoluminescence10ascanning electron microscopy10atransmission electron microscopy10aZinc oxide1 aSheini, Farid, Jamali1 aMulla, Imtiaz, S.1 aJoag, Dilip, S.1 aMore, Mahendra, A.  uhttps://library.ncl.res.in/content/influence-process-variables-growth-zno-nanowires-cathodic-electrodeposition-zinc-substrate-0