@article { ISI:000228904900029,
	title = {Deposition of PTFE thin films by RF plasma sputtering on < 100 > silicon substrates},
	journal = {Applied Surface Science},
	volume = {245},
	number = {1-4},
	year = {2005},
	month = {MAY},
	pages = {202-207},
	publisher = {ELSEVIER SCIENCE BV},
	type = {Article},
	address = {PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS},
	abstract = {<p>Polymers have been studied extensively due to the wonderful array of properties presented by them. Polymer materials can be coated/deposited by various techniques like sputtering (magnetron, ion beam, RF or dc), plasma polymerization, etc. and can be used in coatings, paint industries, etc. The present study deals with the RF sputter deposition of poly(tetrafluoro ethylene) (PTFE), commonly known as Teflon. Depositions were carried out on mirror polished silicon (1 0 0) substrates at different powers in the range of 100-200 W. The deposition time was kept constant at 60 min. The sputtered film shows lower contact angle of 50\&amp;DEG; with water and 44\&amp;DEG; with diiodomethane, a lower interfacial tension value of 0.76 dyne/cm, indicating hydrophilicity and good adhesion of the film with the substrate. FHR indicates presence of C-F, C-F-2 bonding groups in the deposited film. Further, XPS study shows presence of CF3 (292.2 eV), CF2 (290.8 eV), C-F (288.0 eV) and C-CF (286.4 eV) moieties indicating deposition of PTFE films at higher power levels of plasma. {\textcopyright} 2004 Elsevier B.V. All rights reserved.</p>},
	keywords = {Contact angle measurement, FTIR, PTFE, RF plasma sputtering, XPS},
	issn = {0169-4332},
	doi = {10.1016/j.apsusc.2004.10.023},
	author = {Bodas, Dhananjay S. and Mandale, A. B. and Gangal, S. A.}
}
@article { ISI:000353754000021,
	title = {Preparation and characterization of self-photostabilizing UV-durable bionanocomposite membranes for outdoor applications},
	journal = {Carbohydrate Polymers},
	volume = {123},
	year = {2015},
	month = {JUN},
	pages = {164-173},
	publisher = {ELSEVIER SCI LTD},
	address = {THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, OXON, ENGLAND},
	abstract = {<p>Here, we report a durable and ultraviolet (UV) resistant nanocomposite membrane of chitosan (CS) with effective photostabilization ascribed to Zinc oxide (ZnO) nanoparticles. Zinc oxide nanoparticles were successfully dispersed in the solution of chitosan polymer. The nanocomposite films with the homogenous dispersion of ZnO nanoparticles in the chitosan matrix were obtained by solution casting method and the influence of ZnO nanoparticles as a photostabilizer was studied. The nanocomposite membranes were photoirradiated by polychromatic radiations with lambda \&gt; 300 nm using mercury vapour lamps in SEPAP instrument. The resulting nanocomposite material exhibited excellent UV-resistance in very low percentages of ZnO nanoparticles. The chitosan membranes showed fast degradation attributes than the nanocomposite membranes. ZnO nanoparticles effectively absorbed UV radiations, thus protecting polymer from radiation degradation. The neat and irradiated nanocomposites of chitosan and ZnO nanoparticles (CS/ZnO) were characterized by Fourier Transform Infrared Spectroscopy (FT-IR) spectroscopy for the chemical changes/degradation taking place. Chitosan nanocomposites were further characterized for tensile properties, contact angle measurements and surface morphology. (C) 2015 Elsevier Ltd. All rights reserved.</p>},
	keywords = {Bionanocomposite membrane, Chitosan, Contact angle measurement, Fourier transform infrared spectroscopy, Photostabilization, Zinc oxide nanoparticles},
	issn = {0144-8617},
	doi = {10.1016/j.carbpol.2014.12.062},
	author = {Kushwaha, Omkar S. and Avadhani, C. V. and Singh, R. P.}
}
