@article { ISI:000238329100023,
	title = {Nitridation of high speed steel by electron cyclotron resonance plasma},
	journal = {Journal of Physics D-Applied Physics},
	volume = {39},
	number = {10},
	year = {2006},
	month = {MAY},
	pages = {2109-2113},
	publisher = {IOP PUBLISHING LTD},
	type = {Article},
	address = {DIRAC HOUSE, TEMPLE BACK, BRISTOL BS1 6BE, ENGLAND},
	abstract = {<p>Plasma nitridation of high speed M2 steel is studied using a microwave assisted electron cyclotron resonance plasma source. A mixture of hydrogen and nitrogen with a proportion of 7 : 3 was used as the nitriding gas. The density of plasma for this forming gas was measured to be similar to 10(18) m(-3) as estimated by a double probe method. The M2 steel was nitrided at various temperatures of 400, 450, 500 and 550 degrees C under similar reactor conditions. The nitrided layer was characterized by using various analytical techniques which included structural, morphological, chemical and microhardness measurement. The maximum thickness of the nitrided layer was found to be 48 mu m for samples nitrided at 550 degrees C. No layer corresponding to white/compound layer is seen in our analysis. The hardness is seen to increase from similar to 580HV to similar to 1190HV for samples nitrided at 550 degrees C. Electron cyclotron resonance plasma nitridation is observed to be much faster and a cleaner process as compared with the conventional nitriding process.</p>},
	issn = {0022-3727},
	doi = {10.1088/0022-3727/39/10/022},
	author = {Majeed, Riyadh M A Abdul and Purohit, Vishwas and Bhide, Rajesh and Mandale, A. B. and Bhoraskar, S. V. and Bhoraskar, Vasant N.}
}
@article { ISI:000290015600029,
	title = {Field emission studies of silver nanoparticles synthesized by electron cyclotron resonance plasma},
	journal = {Applied Surface Science},
	volume = {257},
	number = {16},
	year = {2011},
	month = {JUN},
	pages = {7184-7189},
	publisher = {ELSEVIER SCIENCE BV},
	address = {PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS},
	abstract = {<p>Field emission has been studied for silver nanoparticles (25-200 nm), deposited within a cylindrical silver target in an electron cyclotron resonance (ECR) plasma. Particle size distribution was controlled by optimum biasing voltages between the chamber and the target. Presence of non-oxidized silver was confirmed from the X-Ray diffraction analysis; however, thin protective layer of oxide was identified from the selective area electron diffraction pattern obtained with transmission electron microscopy. The silver nanoparticles were seen to exhibit hilly pointed like structures when viewed under the atomic force microscopy (AFM). The emissive properties of these particles were investigated by field emission microscopy. It is found that this technique of deposition is ideal for formation of nanoparticles films on different substrate geometries with size controllability as well as its application to emission devices. (C) 2011 Elsevier B.V. All rights reserved.</p>},
	keywords = {Cold plasma, field emission, Nanoparticles, thin film},
	issn = {0169-4332},
	doi = {10.1016/j.apsusc.2011.03.088},
	author = {Purohit, Vishwas and Mazumder, Baishakhi and Bhise, Ashok B. and Poddar, Pankaj and Joag, Dilip S. and Bhoraskar, S. V.}
}
