@article { ISI:000274839100053,
	title = {Synthesis and characterization of nickel selenide thin films deposited by chemical method},
	journal = {Journal of Alloys and Compounds},
	volume = {490},
	number = {1-2},
	year = {2010},
	month = {FEB},
	pages = {228-231},
	publisher = {ELSEVIER SCIENCE SA},
	address = {PO BOX 564, 1001 LAUSANNE, SWITZERLAND},
	abstract = {<p>Nickel selenide thin films have been deposited using chemical bath method on non-conducting glass substrates in a tartarate bath containing nickel sulphate octahydrate, hydrazine hydrate, sodium seleno-sulphate in an aqueous alkaline medium. The grown films were uniform, well adherent and black in color. The films were characterized using X-ray diffraction, scanning electron microscopy, optical absorption and electrical measurements. The nickel selenide thin film revealed polycrystalline nature with hexagonal system. The direct optical band gap of the film was found to be 1.61 eV. Electrical resistivity of film was observed in the order of 10(3) (Omega cm) with p-type conduction mechanism. (C) 2009 Elsevier B.V. All rights reserved.</p>},
	keywords = {Crystal growth, Semiconductors, Thin films, X-ray diffraction},
	issn = {0925-8388},
	doi = {10.1016/j.jallcom.2009.09.132},
	author = {Hankare, P. P. and Jadhav, B. V. and Garadkar, K. M. and Chate, P. A. and Mulla, Imtiaz S. and Delekar, S. D.}
}
