@article { ISI:000240521800008,
	title = {Adsorption of methanol on Si(100)/SiO(2)and mesoporous SBA-15},
	journal = {Colloids and Surfaces A-Physicochemical and Engineering Aspects},
	volume = {287},
	number = {1-3},
	year = {2006},
	month = {SEP},
	pages = {51-58},
	publisher = {ELSEVIER SCIENCE BV},
	address = {PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS},
	abstract = {<p>Adsorption of methanol on SiO(100)/SiO2 substrate and mesoporous SBA-15 has been studied by using Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS). Contact angle technique is employed to study the adsorption kinetics of methanol on SiO(100)/SiO2 and thermal stability of adlayer. Thermogravimetric (TGA) technique is used to understand the thermal behavior of methanol layer on SBA-15. Adsorption kinetics fit fairly well with Langmuir isotherms giving adsorption rate constant, k(a) = 0.0021 W s(-1). FTIR results show formation of methoxy silicon (SiOCHA silicon polyhydride (SiH2), carboxylate, molecular water and hydroxyl groups on Si(100)/SiO2 surface and only methoxy silicon on SBA-15. XPS results confirm methanol adsorption and support FTIR results. The methanol adlayers are found to be thermally stable up to a temperature of similar to 262 degrees C on both Si(100)/SiO2 and SBA-15 and decompose between 262 and 450 degrees C. (c) 2006 Elsevier B.V. All rights reserved.</p>},
	keywords = {Adsorption, desorption, kinetics, Methanol, SBA-15, Si(100)/SiO2, thermal stability},
	issn = {0927-7757},
	doi = {10.1016/j.colsurfa.2006.03.021},
	author = {Mirji, S. A. and Halligudi, Shivaraj B. and Mathew, Nevin T. and Ravi, V. and Jacob, Nalini E. and Patil, K. R.}
}
@article { ISI:000241976500018,
	title = {Adsorption of octadecyltrichlorosilane on Si(100)/SiO2 and SBA-15},
	journal = {Colloids and Surfaces A-Physicochemical and Engineering Aspects},
	volume = {289},
	number = {1-3},
	year = {2006},
	month = {OCT},
	pages = {133-140},
	publisher = {ELSEVIER SCIENCE BV},
	type = {Article},
	address = {PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS},
	abstract = {<p>Adsorption of octadecyltrichlorosilane (OTS) on Si(100)/SiO2 substrate and mesoporous SBA-15 has been studied by energy dispersive X-ray analysis (EDAX), Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS). Contact angle technique is used to study the adsorption kinetics of OTS on Si(100)/SiO2 and thermal stability of adsorbed OTS layer. Thermogravirnetric (TGA) technique is employed to understand the thermal behavior of OTS adlayer on SBA-15. Langmuir isotherms fit very well with OTS adsorption kinetics data on Si(100)/SiO2 and furnish adsorption rate constant, k(a) = 236 M-1 s(-1), desorption rateconstant, k(d) = 0.0082s(-1) and Gibbs free energy of adsorption, Delta G(ads) = -6.28 kcal mol(-1). EDAX and XPS results both show increased carbon content due to OTS adsorption and decreased oxygen and silicon content due to screening of these elements by OTS adlayer. FTIR data shows methylene (-CH2) and methyl (-CH3) stretching bands, in close agreement with reported data. The OTS layers are found to be thermally. stable up to a temperature of approximate to 260 degrees C on both Si(100)/SiO2 and SBA-15. (c) 2006 Elsevier B.V. All rights reserved.</p>},
	keywords = {Adsorption, Gibbs free energy, OTS, SBA-15, Self-assembly, Si(100)/SiO2, thermal stability},
	issn = {0927-7757},
	doi = {10.1016/j.colsurfa.2006.04.021},
	author = {Mirji, S. A.}
}
