@article { ISI:000232864800021,
	title = {Growth kinetics and thermodynamic stability of octadecyltrichlorosilane self-assembled monolayer on Si (100) substrate},
	journal = {Materials Letters},
	volume = {59},
	number = {29-30},
	year = {2005},
	month = {DEC},
	pages = {3890-3895},
	publisher = {ELSEVIER SCIENCE BV},
	type = {Article},
	address = {PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS},
	abstract = {<p>We have studied the growth kinetics and thermodynamic stability of octadecyltrichlorosilane (OTS) self-assembled monolayers on Si (100) substrate in order to understand its role in controlling the adhesion and surface hydrophobicity. Time-dependent contact angle measurements, using water as a function of OTS concentration, show rapid monolayer formation in the initial stage followed by a slow attainment of full coverage and the overall kinetics approximately follows the Langmuir adsorption isotherm. The adsorption rate constant (k(a) = 150 M-1 s(-1)) is found to be significantly greater than the desorption rate constant (k(d) = 0.156 s(-1)) while the Gibbs free energy (Delta G(ads)) change amounts to -4.2 kcal/mol suggesting thermodynamic stability of OTS monolayer on a silicon surface. Partial monolayer formation by a {\textquoteleft}uniform{\textquoteright} growth mechanism, even at low coverage, is revealed by atomic force microscopy (AFM) in conjunction with grazing angle FTIR spectroscopy. Analysis of the interfacial adhesion properties using Zisman plot suggests a critical surface tension (gamma(c)) of 20.7 dyn/cm for OTS monolayer on Si (100) surface. (C) 2005 Elsevier B.V. All rights reserved.</p>},
	keywords = {Gibbs{\textquoteright}s free energy (AG), growth kinetics, octadecyltrichlorosilane (OTS), self-assembled monolayers (SAMs), Zisman plot},
	issn = {0167-577X},
	doi = {10.1016/j.matlet.2005.07.026},
	author = {Kulkarni, S. A. and Mirji, S. A. and Mandale, A. B. and Gupta, R. P. and Vijayamohanan, K. P.}
}
