@article { ISI:000258370500015,
	title = {New approach towards imaging lambda-DNA using scanning tunneling microscopy/spectroscopy (STM/STS)},
	journal = {Bulletin of Materials Science},
	volume = {31},
	number = {3},
	year = {2008},
	note = {National Review and Coordination Meeting on Nanoscience and Nanotechnology, Hyderabad, INDIA, 2007},
	month = {JUN},
	pages = {309-312},
	publisher = {SPRINGER},
	address = {233 SPRING ST, NEW YORK, NY 10013 USA},
	abstract = {<p>A new methodology to anchor A-DNA to silanized n-Si(111) surface using Langmuir Blodget trough was developed. The n-Si (111) was silanized by treating it with low molecular weight octyltrichlorosilane in toluene. Scanning tunneling microscopy (STM) image of lambda-DNA on octyltrichlorosilane deposited Si substrate shows areas exhibiting arrayed structures of 700 nm length and 40 nm spacing. Scanning tunneling spectroscopy (STS) at different stages depict a broad distribution of defect states in the bandgap region of n-Si(111) which presumably facilitates tunneling through otherwise insulating DNA layer.</p>},
	keywords = {DNA, Langmuir Blodget technique, Scanning tunneling microscopy, silanization},
	issn = {0250-4707},
	doi = {10.1007/s12034-008-0049-6},
	author = {Dey, Shirshendu and Pethkar, Sushama and Adyanthaya, Suguna D. and Sastry, Murali and Dharmadhikari, C. V.}
}
