%0 Journal Article %J Materials Letters %D 2005 %T Growth kinetics and thermodynamic stability of octadecyltrichlorosilane self-assembled monolayer on Si (100) substrate %A Kulkarni, S. A. %A Mirji, S. A. %A Mandale, A. B. %A Gupta, R. P. %A Vijayamohanan, K. P. %K Gibbs's free energy (AG) %K growth kinetics %K octadecyltrichlorosilane (OTS) %K self-assembled monolayers (SAMs) %K Zisman plot %X

We have studied the growth kinetics and thermodynamic stability of octadecyltrichlorosilane (OTS) self-assembled monolayers on Si (100) substrate in order to understand its role in controlling the adhesion and surface hydrophobicity. Time-dependent contact angle measurements, using water as a function of OTS concentration, show rapid monolayer formation in the initial stage followed by a slow attainment of full coverage and the overall kinetics approximately follows the Langmuir adsorption isotherm. The adsorption rate constant (k(a) = 150 M-1 s(-1)) is found to be significantly greater than the desorption rate constant (k(d) = 0.156 s(-1)) while the Gibbs free energy (Delta G(ads)) change amounts to -4.2 kcal/mol suggesting thermodynamic stability of OTS monolayer on a silicon surface. Partial monolayer formation by a `uniform' growth mechanism, even at low coverage, is revealed by atomic force microscopy (AFM) in conjunction with grazing angle FTIR spectroscopy. Analysis of the interfacial adhesion properties using Zisman plot suggests a critical surface tension (gamma(c)) of 20.7 dyn/cm for OTS monolayer on Si (100) surface. (C) 2005 Elsevier B.V. All rights reserved.

%B Materials Letters %I ELSEVIER SCIENCE BV %C PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS %V 59 %P 3890-3895 %8 DEC %G eng %N 29-30 %9 Article %3

Foreign

%4 2.437 %R 10.1016/j.matlet.2005.07.026